MASKLESS EXPOSURE SYSTEM
Category: Precision Optics / Image Sensing
Exhibitor: TECLIN CORP., LTD.
Booth No: K616
•Direct imaging exposure is applicable to experimentation, research, prototype, small-lot production, or etc.
•Applications range from high-end PCBs, high density packaging, flat panel displays, etc. to the micromachining field like MEMS, etc.
•No photomask is needed in the lithography process, which minimizes development cost and time lag to the market.
•Also, custom system composition is available to meet the customers' requests.
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