Sputtering Targets

 

Category: 3D Printing Components & Supplies

Exhibitor: FULL WELFARE CO., LTD.

Booth No: Q807

 

Characteristic

 

Metal powder manufactured by vacuum induction melting/ inert gas atomization with Sanyo’s original technology provides superior sputtering targets with fine microstructure and high compositional homogeneity.

CHARACTERISTICS:
※High density targets are produced by using suitable consolidation process (Ultra High Pressing or Hot Isostatic Pressing (HIP))
※Sanyo’s targets contribute to the improvement of customer’s productivity by high PTF conversion and high toughness with fine microstructure.
※Various compositions such as Fe-Based, Co-Based, Ni-Based and Cr-Based alloy, have been delivered with Sanyo’s unique material design, to meet customer’s request.

Material List
For HDD-media - Cr/Ti , Ni/Ta , Co/W , Ni/W , Ni/Fe/W , Co/Zr/Nb , Co/Fe/Zr/Nb , Co/Fe/Ta/Mo , Co/Fe/B ...etc。

For magnetic heads - Co/Fe/B , Co/Fe , Co , Ni/Fe ,Ta alloys , Tb alloys , Fe/Si/Al ...etc。

For coating - Cr/V , Cr/Ti , Cr/B , Ti/Al , Ti/B , Al/Cr...etc。

 

Other Products

 

• 

  3D printing metal powders

• 

  Metal injection molding’s alloy powders

• 

  Laser cladding/ Thermal spraying/ Plasma transferred arc welding/ Brazing

• 

  Flaky softmagnetic metal powders

 

 

 

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